Picture of Bati5 (RIE)
Current status:
AVAILABLE
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Group:
CMNF - Gravure
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Applications

The tool is capable of etching silicon nitrides, silicon oxides, polysilicon, tungsten, tungsten silicide and various polymers (BCB, PMMA, PEDOT).

Principal specifications

  • RF (13.56 MHz) powered lower electrode (6 - 600 W)
  • Available gases: Ar, N2, O2, SF6, CF4, CHF3
  • Substrate temperature control
  • 240 mm diameter table allowing for 200 mm (8”) batch capacity.
  • Automatic RF matching network
  • Control by PC using Oxford PC2000 software
  • Endpoint detection through laser interferometry (JY Horiba hardware, in-house software “PlasmaScope”)
  • Continuous process datalogging
Tool name:
Bati5 (RIE)
Manufacturer:
OIPT, UK
Model:
PlasmaLab 80 Plus

Instructors

Licensed Users

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