Picture of Oxford ICP Ch2 (ICP-RIE)
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One of two chambers on the Oxford Plasmalab System 100 cluster. 

This chamber has the following gases available: Ar, BCl3, Cl2, O2, SF6

It is mainly for etching GaAs, AlGaAs, GaN...

The electrode can be actively cooled (min 0 °C) (no heating). 

Tool name:
Oxford ICP Ch2 (ICP-RIE)
Manufacturer:
OIPT, UK
Model:
ICP PlasmaLab 100

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