Picture of Sentech (ICP-RIE)
Current status:
AVAILABLE
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Group:
CMNF - Gravure
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Available process gases:

Gas name Max Flow (sccm)
SiCl4 50
BCl3 200
Cl2 100
HBr 100
SF6 500
CF4 200
CHF3 200
CH4 100
H2 100
N2 50
Ar 50
He 50
O2 50
  • Other gases:
  • He (for wafer backside cooling)
  • N2 (for system venting)
Tool name:
Sentech (ICP-RIE)
Manufacturer:
Sentech GmbH, D
Model:
SENTECH SI 500

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Licensed Users

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