Picture of E-beam B028
Current status:
AVAILABLE
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Group:
CMNF - Lithographie
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EBPG5000Plus is an Electron Beam Lithography tool. It is capable of writing features smaller than 10nm and placing

structures on a substrate with an accuracy of less than 20nm.

Some of the key specifications are outlined in the following:

  • 20, 50 and 100keV Thermal Field Emission Gun
  • High Resolution Gaussian Beam System
  • 50MHz Intelligent Pattern Generator
  • 1.25nm minimum pixel size
  • Robust Direct Write Mark Detection & Alignment Software
  • 10 positions load lock for batch processing of multiple substrates
  • Holders for 50mm, 75mm, 100mm wafers, 4 and 5” masks and smaller piece parts
  • Housed in a custom clean-room which maintains a temperature of 21°C ± 0.1°C
  • Overlay and stitching better than 30nm
Tool name:
E-beam B028
Manufacturer:
RAITH
Model:
EBPG 5000 PLUS

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