B010 (EBPG5000Plus) is an e-beam lithography tool. It is capable of writing features smaller than 10nm and placing structures on a substrate with an accuracy of less than 30nm.

Some of the key specifications are outlined in the following:

• 20, 50 and 100keV Thermal Field Emission Gun
• High Resolution Gaussian Beam System
• 50MHz Intelligent Pattern Generator
• 1.25nm minimum pixel size
• Robust Direct Write Mark Detection & Alignment Software
• 10 positions load lock for batch processing of multiple substrates
• Holders for 50mm, 75mm, 100mm wafers, 4 and 5” masks and smaller piece parts
• Overlay and stitching better than 30nm