Picture of TEPLA (Stripping, ashing)
Current status:
AVAILABLE
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Group:
CMNF - Gravure
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Description

Applications

  • Photoresist stripping
  • Surface cleaning after storage
  • Surface cleaning after processes (photolithography, wet etching dry etching)
  • Removal of organic passivating layers and masks
  • Resist descum process
Details
Tool name:
TEPLA (Stripping, ashing)
Manufacturer:
PVA TePla AG, D
Model:
PVA Tepla 300 semi auto
Typical process information
Number O2 CF4 Ar Power
(W)		 Nominal
Time
(min)
1 525 0 0 500 1
2 525 0 0 500 5
3 525 0 0 500 10
4 525 0 0 500 15
5 525 0 0 500 30
6 525 0 0 500 60
7 525 0 0 700 5
8 525 0 0 700 10
9 525 0 0 700 15
10 525 0 0 700 30
11 525 0 0 700 60
12 525 0 0 800 5
13 525 0 0 800 10
14 525 0 0 800 15
15 525 0 0 800 30
16 525 0 0 800 60
17 525 0 0 1000 5
18 525 0 0 1000 10
19 525 0 0 1000 15
20 525 0 0 1000 30
21 525 0 0 1000 60
22 525 0 0 50 2
23 525 0 0 100 2
24 525 0 0 100 5
25 525 0 0 100 20
26 525 0 0 100 40
27 525 0 0 200 20
28 525 0 0 200 40
29 525 0 0 300 20
30 525 0 0 300 40
31 360 40 0 1000 5
32 360 40 0 1000 10
33 360 40 0 1000 15
34 360 40 0 1000 30
35 490 50 0 800 5
36 490 50 0 800 10
37 490 50 0 800 15
38 490 50 0 800 30
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Tool Modes
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