One of two chambers on the Oxford Plasmalab System 100 cluster.
This chamber has the following gases available: Ar, BCl3, Cl2, O2, SF6
It is mainly for etching GaAs, AlGaAs, GaN...
The electrode can be actively cooled (min 0 °C) (no heating).
Equipement sur badgeuse BCM depuis le 21 mai 2021