One of two chambers on the Oxford Plasmalab System 100 cluster.
This chamber has the following gases available: Ar, CH4, Cl2, H2, O2, SF6
It is mainly for etching InP, InGaAsP, InGaAs, ...
The electrode can be actively cooled (min 0 °C) and actively heated (max 100 °C)
Equipement sur badgeuse BCM depuis le 21 mai 2021