Tools
All tools
Info
General documents
Sitemap
User access
Login
IEMN
FEMTO
LAAS
C2N
No access?
Apply for access
here...
Login
U
sername:
P
assword:
User Name is required.
Password is required.
Forgot your password?
Sentech (ICP-RIE) (CMNF(gra)CT_42_b_BCM)
Current status:
WARNING
Book
|
Log
|
Show/Collapse all
Responsibles
Group:
CMNF - Gravure
Files
You must be logged in to view files.
Description
Available process gases:
Gas name
Max Flow
(sccm)
SiCl
4
50
BCl
3
200
Cl2
100
HBr
100
SF
6
500
CF
4
200
CHF
3
200
CH
4
100
H
2
100
N
2
50
Ar
50
He
50
O
2
50
Other gases:
He (for wafer backside cooling)
N2 (for system venting)
Equipement sur badgeuse BCM depuis le 02 mai 2021
Details
Tool name:
Sentech (ICP-RIE)
Manufacturer:
Sentech GmbH, D
Model:
SENTECH SI 500
Instructors & Licensed Users
Instructors
Licensed Users
Tool Modes
You must be logged in to view tool modes.
This may take a while...please wait.
×
User Information
Name:
Telephone:
Mobile:
E-mail:
University/Company:
Laboratory:
Send Message
Subject:
Message:
Send