The Laurell WS-650-23 B spin coater system will accommodate up to ø150mm wafers and 5" × 5" (127mm × 127mm) substrates, and features a maximum rotational speed of 12,000 RPM (based on a ø100mm silicon wafer).

 The WS-650 series is typically employed for Solvent, Base or Acid-based processing:

-Coating

-Etching

-Developing

-Rinsing-Drying

-Cleaning.

  The process controller allows operator interaction in real-time during the process execution including pausing time, stopping and continuing from that point.

 The housing for this system is made from a solid co-polymer blend which is able to resist solvents and strong acids and bases.

  The closed bowl design, coupled with the precision of the process controller, allows most coating materials to dry in a quiescent state, increasing uniformity and minimizing particle contamination.

 A proprietary labyrinth seal protects the motor and control electronics from chemical contamination. This seal provides the process chamber with Nitrogen purge and has been proven to be particle-free on a sub-micron level during field testing.

bcm_29/09/2021